6850-01-314-9784

Deep Etch Lithographic Plate Cleaning Solution

6850013149784 013149784 77-9801-3796-0

An item compounded of various ingredients, such as water and organic acids. It is applied to a deep etch lithographic plate to remove the light-hardened resist. View more Deep Etch Lithographic Plate Cleaning Solution

6850-01-314-9784 LITHOGRAPHIC PLATE CLEANING SOLUTION,DEEP ETCH 6850013149784 013149784

Managed by United States
NSN Created on 9 Feb 1990
Data Last Changed
November 2023
NATO Update Count
4
NATO Data Quality
6850-01-314-9784 LITHOGRAPHIC PLATE CLEANING SOLUTION,DEEP ETCH 6850013149784 013149784 1/1
NSN 6850-01-314-9784 (Generic Image) 1/1

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6850-01-314-9784 Demil Restrictions 6850-01-314-9784

DEMIL: A | DEMILI: | CRITICALITY: X | HMIC: Y | PMIC: A | EDC: | ADPEC:

6850-01-314-9784 is a Deep Etch Lithographic Plate Cleaning Solution that does not have a nuclear hardened feature or any other critical feature such as tolerance, fit restriction or application. This item is considered a low risk when released from the control of the Department of Defense. The item may still be subject to the requirements of the Export Administration Regulations (EAR) and the Code of Federal Regulations (CFR). This item has been determined to be hazardous and information is contained in the Hazardous Materials Information Resource System (HMIRS). This item does not contain a precious metal.

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