6850-17-111-5101

Deep Etch Lithographic Plate Etch

6850171115101 171115101 HIGH SPEED ACCUGUARD REPLENISHER 17019-60LTR

An item compounded of various ingredients, such as calcium chloride solution, ferric chloride, and hydrochloric acid, which is applied after the plate is developed to etch the image slightly into the metal. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Etch

6850-17-111-5101 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850171115101 171115101

Managed by Netherlands
NSN Created on 29 Jan 1998
Data Last Changed
January 2023
NATO Update Count
1
NATO Data Quality
6850-17-111-5101 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850171115101 171115101 1/1
NSN 6850-17-111-5101 (Generic Image) 1/1

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6850-17-111-5101 Related Documents Related Documents 6850-17-111-5101 5+ Documents (More...)

HIGH SPEED ACCUGUARD REPLENISHER 17019-60LTR An item compounded of various ingredients, such as calcium
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Deep Etch Lithographic Plate Etch 171115101 Deep Etch Lithographic Plate Etch 131131838 Updated
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6850-17-111-5101 Demil Restrictions 6850-17-111-5101

DEMIL: | DEMILI: | CRITICALITY: | HMIC: | PMIC: | EDC: | ADPEC:

6850-17-111-5101 is a Deep Etch Lithographic Plate Etch

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