6850-17-106-7666

Deep Etch Lithographic Plate Etch

6850171067666 171067666 ETSMIDDEL MACUPREP G-3 25KG

An item compounded of various ingredients, such as calcium chloride solution, ferric chloride, and hydrochloric acid, which is applied after the plate is developed to etch the image slightly into the metal. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Etch

6850-17-106-7666 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850171067666 171067666

Managed by Netherlands
NSN Created on 11 Nov 1992
Data Last Changed
January 2023
NATO Update Count
1
NATO Data Quality
6850-17-106-7666 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850171067666 171067666 1/1
NSN 6850-17-106-7666 (Generic Image) 1/1

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ETSMIDDEL MACUPREP G-3 25KG An item compounded of various ingredients, such as calcium chloride solution
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6850-17-106-7666 Demil Restrictions 6850-17-106-7666

DEMIL: | DEMILI: | CRITICALITY: | HMIC: | PMIC: | EDC: | ADPEC:

6850-17-106-7666 is a Deep Etch Lithographic Plate Etch

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