6850-22-617-9260

Deep Etch Lithographic Plate Developer

6850226179260 226179260 209-5353 SENO 4006

An item compounded of various ingredients, such as calcium chloride and lactic acid. It is used to remove the parts of the coating not exposed to light in the deep-etch process of lithographic plate making. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Developer

6850-22-617-9260 LITHOGRAPHIC PLATE DEVELOPER,DEEP ETCH 6850226179260 226179260

Managed by Denmark
NSN Created on 17 Sep 2008
Data Last Changed
January 2023
NATO Update Count
1
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6850-22-617-9260 LITHOGRAPHIC PLATE DEVELOPER,DEEP ETCH 6850226179260 226179260 1/1
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6850-22-617-9260 Deep Etch Lithographic Plate Developer
209-5353 SENO 4006 An item compounded of various ingredients, such as calcium chloride and lactic acid
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6850-22-617-9260 Demil Restrictions 6850-22-617-9260

DEMIL: | DEMILI: | CRITICALITY: | HMIC: | PMIC: | EDC: | ADPEC:

6850-22-617-9260 is a Deep Etch Lithographic Plate Developer

6850-22-617-9260 End Users End Users 6850-22-617-9260

Denmark (ZS)

6850-22-617-9260 Manufacturers Approved Sources 6850-22-617-9260

Part Number
Manufacturer
Status
209-5353
R0243 - Rs Components A/S (Active)
Primary Buy
RNCC 3 RNVC 2 DAC 4
SENO 4006
R0243 - Rs Components A/S (Active)
Primary Buy
RNCC 3 RNVC 2 DAC 4

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6850-13-120-4561 6850-13-120-4549 6850-00-616-1562 6850-13-110-6283 6850-00-947-1381 6850-13-113-2017 6850-12-356-2437 6850-00-173-7185 6850-01-152-9112 6850-00-558-0140 6850-22-617-9260 6850-01-356-1171