6850-13-113-2017
Deep Etch Lithographic Plate Developer
6850131132017 131132017 H85U3
An item compounded of various ingredients, such as calcium chloride and lactic acid. It is used to remove the parts of the coating not exposed to light in the deep-etch process of lithographic plate making. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Developer
Managed by Belgium
NSN Created on 2 Feb 1988
Data Last Changed
January 2023
January 2023
NATO Update Count
1
1
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Marketplace 6850-13-113-2017
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Restrictions 6850-13-113-2017
Approved Sources 6850-13-113-2017
- Part Number
- Manufacturer
- Status
- H85U3
- Manufacturer
- B1112 - Agfa - Gevaert Nv (Active)
- Primary Buy
- Primary Buy
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