6850-13-113-2017

Deep Etch Lithographic Plate Developer

6850131132017 131132017 H85U3

An item compounded of various ingredients, such as calcium chloride and lactic acid. It is used to remove the parts of the coating not exposed to light in the deep-etch process of lithographic plate making. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Developer

6850-13-113-2017 LITHOGRAPHIC PLATE DEVELOPER,DEEP ETCH 6850131132017 131132017

Managed by Belgium
NSN Created on 2 Feb 1988
Data Last Changed
January 2023
NATO Update Count
1
NATO Data Quality
6850-13-113-2017 LITHOGRAPHIC PLATE DEVELOPER,DEEP ETCH 6850131132017 131132017 1/1
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6850-13-113-2017 Demil Restrictions 6850-13-113-2017

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6850-13-113-2017 is a Deep Etch Lithographic Plate Developer

6850-13-113-2017 Manufacturers Approved Sources 6850-13-113-2017

Part Number
Manufacturer
Status
H85U3
B1112 - Agfa - Gevaert Nv (Active)
Primary Buy
RNCC 3 RNVC 2 DAC 6

6850-13-113-2017 Related Items NATO Stock Numbers Related to 6850-13-113-2017

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