6850-13-113-2017

Deep Etch Lithographic Plate Developer

6850131132017 131132017 H85U3

An item compounded of various ingredients, such as calcium chloride and lactic acid. It is used to remove the parts of the coating not exposed to light in the deep-etch process of lithographic plate making. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Developer

Managed by Belgium

NSN Created on 2 Feb 1988

Data Last Changed
January 2023

NATO Update Count
1

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6850-13-113-2017 LITHOGRAPHIC PLATE DEVELOPER,DEEP ETCH 6850131132017 131132017 1/1 — NSN 6850-13-113-2017 (Generic Image) 1/1

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