6850-13-113-1838
Deep Etch Lithographic Plate Etch
6850131131838 131131838 C2N1C
An item compounded of various ingredients, such as calcium chloride solution, ferric chloride, and hydrochloric acid, which is applied after the plate is developed to etch the image slightly into the metal. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Etch
Managed by Belgium
NSN Created on 5 Jan 1988
Data Last Changed
January 2023
January 2023
NATO Update Count
1
1
NATO Data Quality
Marketplace 6850-13-113-1838
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Related Documents 6850-13-113-1838 5+ Documents (More...)
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Cleaning Compound 131185826683001 RNCC: 3 | RNVC: 2 SAFETY CLEAN RNCC: 5 | RNVC: 2 3 Feb 2003 6850-13-113-1838
Restrictions 6850-13-113-1838
Approved Sources 6850-13-113-1838
- Part Number
- Manufacturer
- Status
- C2N1C
- Manufacturer
- B1112 - Agfa - Gevaert Nv (Active)
- Primary Buy
- Primary Buy
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