6850-13-113-1838

Deep Etch Lithographic Plate Etch

6850131131838 131131838 C2N1C

An item compounded of various ingredients, such as calcium chloride solution, ferric chloride, and hydrochloric acid, which is applied after the plate is developed to etch the image slightly into the metal. When of a single specific chemical, use specific chemical name. View more Deep Etch Lithographic Plate Etch

6850-13-113-1838 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850131131838 131131838

Managed by Belgium
NSN Created on 5 Jan 1988
Data Last Changed
January 2023
NATO Update Count
1
NATO Data Quality
6850-13-113-1838 LITHOGRAPHIC PLATE ETCH,DEEP ETCH 6850131131838 131131838 1/1
NSN 6850-13-113-1838 (Generic Image) 1/1

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6850-13-113-1838 Demil Restrictions 6850-13-113-1838

DEMIL: | DEMILI: | CRITICALITY: | HMIC: | PMIC: | EDC: | ADPEC:

6850-13-113-1838 is a Deep Etch Lithographic Plate Etch

6850-13-113-1838 Manufacturers Approved Sources 6850-13-113-1838

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