Multibeam Corporation
CAGE Code: 6FV70
NCAGE Code: 6FV70
Status: Active
Type: Manufacturer
Dun & Bradstreet (DUNS): 968147020
Summary
Multibeam Corporation is an Active Manufacturer with the Cage Code 6FV70 and is tracked by Dun & Bradstreet under DUNS Number 968147020..
Address
3951 Burton Dr
Santa Clara CA 95054-1583
United States
Points of Contact
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Frequently Asked Questions (FAQ) for CAGE 6FV70
- What is CAGE Code 6FV70?
- 6FV70 is the unique identifier used by NATO Organizations to reference the physical entity known as Multibeam Corporation located at 3951 Burton Dr, Santa Clara CA 95054-1583, United States.
- Who is CAGE Code 6FV70?
- 6FV70 refers to Multibeam Corporation located at 3951 Burton Dr, Santa Clara CA 95054-1583, United States.
- Where is CAGE Code 6FV70 Located?
- CAGE Code 6FV70 is located in Santa Clara, CA, USA.
Contracting History for CAGE 6FV70 Most Recent 25 Records
- FA865020C1958
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- 24 Mar 2022
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $13,850,000.00
- Department Of Defense (Dod)
- FA865020C1958
- Full Wafer Patterning Of Al Interconect Layers At Sop Nodes
- 4 Apr 2023
- Full Wafer Patterning Of Al Interconect Layers At Sop Nodes
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $37,586,245.00
- Department Of Defense (Dod)
- FA865020C1958
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- 20 Aug 2020
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- Fa8650 Usaf Afmc Afrl Pzl Rak Rxk
- Department Of Defense (Dod)
- $12,000,000.00
- Department Of Defense (Dod)
- FA865020C1958
- Full Wafer Patterning Of Al Interconect Layers At Sop Nodes
- 5 Jun 2023
- Full Wafer Patterning Of Al Interconect Layers At Sop Nodes
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $37,586,245.00
- Department Of Defense (Dod)
- FA865020C1958
- Full Wafer Patterning With Multicolumn E-Beam Lithography (Mebl) Of All Interconnect Layers Enveloping State-Of-Practice (Sop) Nodes
- 8 Sep 2022
- Full Wafer Patterning With Multicolumn E-Beam Lithography (Mebl) Of All Interconnect Layers Enveloping State-Of-Practice (Sop) Nodes
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $18,593,023.00
- Department Of Defense (Dod)
- FA865020C1958
- Full Wafer Patterning Of All Interconnect Layers At Sop Nodes (Mebl)
- 20 Dec 2022
- Full Wafer Patterning Of All Interconnect Layers At Sop Nodes (Mebl)
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $24,255,023.00
- Department Of Defense (Dod)
- FA865020C1958
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- 1 Nov 2021
- Full-Wafer Patterning Of All Interconnect Layers At Sop Nodes
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $12,000,000.00
- Department Of Defense (Dod)
- FA865020C1958
- Multibeam
- 25 Jan 2023
- Multibeam
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $37,586,245.00
- Department Of Defense (Dod)
- FA865019C1938
- "Mebl-Embedded Chip Id To Assure Traceability And Provenance Of All Lcs"
- 30 Sep 2019
- "Mebl-Embedded Chip Id To Assure Traceability And Provenance Of All Lcs"
- Fa8650 Usaf Afmc Afrl Pzl Rak Rxk
- Department Of Defense (Dod)
- $8,164,910.00
- Department Of Defense (Dod)
- FA865019C1938
- Mebl- Embedded Chip Id To Assure Traceability And Provenance Of All Ics
- 26 May 2020
- Mebl- Embedded Chip Id To Assure Traceability And Provenance Of All Ics
- Fa8650 Usaf Afmc Afrl Pzl Rak Rxk
- Department Of Defense (Dod)
- $11,164,910.00
- Department Of Defense (Dod)
- FA865019C1938
- Multi-Electron Beam Lithography (Mebl) - Embedded Chip Id To Assure Traceability And Provenance Of All Ics
- 1 Apr 2022
- Multi-Electron Beam Lithography (Mebl) - Embedded Chip Id To Assure Traceability And Provenance Of All Ics
- Fa8650 Usaf Afmc Afrl Pzl Afrl/Pzl
- Department Of Defense (Dod)
- $11,164,910.00
- Department Of Defense (Dod)
- FA945317C0015
- This Requirement Will Satisfy The Need For An Advanced Lithography Tool For Government Integrated Circuits. The Existing Underlying Process Is Significantly Slower By Commercial Standards. Thus An Individual Multibeam Module Tool
- 18 Nov 2019
- This Requirement Will Satisfy The Need For An Advanced Lithography Tool For Government Integrated Circuits. The Existing Underlying Process Is Significantly Slower By Commercial Standards. Thus An Individual Multibeam Module Tool
- Fa9453 Det 8 Afrl Pkv8
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- FA945317C0015
- Multi Beam
- 20 May 2021
- Multi Beam
- Fa9453 Det 8 Afrl Pkv8
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- HDTRA114C0111
- Low-Energy Maskless Lithography To Mitigate Radiation Effects In Advanced Nanoscale Microelectronics
- 29 Mar 2018
- Low-Energy Maskless Lithography To Mitigate Radiation Effects In Advanced Nanoscale Microelectronics
- Defense Threat Reduction Agency
- Department Of Defense (Dod)
- $949,985.43
- Department Of Defense (Dod)
- HDTRA114C0111
- Low-Energy Maskless Lithography To Mitigate Radiation Effects In Advanced Nanoscale Microelectronics
- 25 Jul 2019
- Low-Energy Maskless Lithography To Mitigate Radiation Effects In Advanced Nanoscale Microelectronics
- Defense Threat Reduction Agency
- Department Of Defense (Dod)
- $948,185.51
- Department Of Defense (Dod)
- FA945317C0015
- Multibeam E-Lithography
- 10 Dec 2020
- Multibeam E-Lithography
- Fa9453 Det 8 Afrl Pkv8
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- FA945317C0015
- Multibeam Corporation
- 27 Jan 2023
- Multibeam Corporation
- Fa9453 Afrl Rvk
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- FA945317C0015
- Multibeam
- 14 Mar 2023
- Multibeam
- Fa9453 Afrl Rvk
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- HDTRA114C0111
- Deobligate Canceling Funds.
- 16 Sep 2019
- Deobligate Canceling Funds.
- Defense Threat Reduction Agency
- Department Of Defense (Dod)
- $948,185.51
- Department Of Defense (Dod)
- FA945317C0015
- Multibeam
- 28 Oct 2020
- Multibeam
- Fa9453 Det 8 Afrl Pkv8
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)
- FA945317C0015
- This Requirement Will Satisfy The Need For An Advanced Lithography Tool For Government Integrated Circuits. The Existing Underlying Process Is Significantly Slower By Commercial Standards. Thus, An Individual Multibeam Module Tool Is An Unattractive Candidate For High-Volume Commercial Fab Production. Although, The Multibeam Prototype Unit Has Demonstrated That It Is Well Suited For Typical High-Value, Low Volume Military/Space Production. The Added Work Will Seek To Complete System Development, Including Portions Completed Or Nearly Completed, Consists Of Five Stages: Proof Of Concept, Prototype Electronics, Feasibility Demo, Prototype System, And Production System. The First Three Of These Are Either Completed Or In Progress.
- 28 Jan 2019
- This Requirement Will Satisfy The Need For An Advanced Lithography Tool For Government Integrated Circuits. The Existing Underlying Process Is Significantly Slower By Commercial Standards. Thus, An Individual Multibeam Module Tool Is An Unattractive Candidate For High-Volume Commercial Fab Production. Although, The Multibeam Prototype Unit Has Demonstrated That It Is Well Suited For Typical High-Value, Low Volume Military/Space Production. The Added Work Will Seek To Complete System Development, Including Portions Completed Or Nearly Completed, Consists Of Five Stages: Proof Of Concept, Prototype Electronics, Feasibility Demo, Prototype System, And Production System. The First Three Of These Are Either Completed Or In Progress.
- Fa9453 Det 8 Afrl Pkv8
- Department Of Defense (Dod)
- $32,300,000.00
- Department Of Defense (Dod)